专利名称：Wafer centering system
发明人：Bellamy, Brad Lee
申请号：EP92303111.6
申请日：19920408
公开号：EP0508748A2
公开日：
19921014
专利内容由知识产权出版社提供
专利附图：
摘要：A system for positioning a wafer (12) at a station within a wafer processing system such that the center of mass of the wafer coincides with the center of the
centering
rotatable chuck (22) at the station. A signal representative of the position of the wafer with respect to the rotatable chuck is produced by a sensor (54) and is utilized to
determine a vector which defines distance and direction of the centering error between the center of rotation of the chuck and the center of mass of the wafer. The chuck and wafer are rotationally indexed through an angle to align the foregoing vector with a line which approximates the arcuate path traversed by the center of mass of the wafer when
it is subsequently conveyed within the system. A transfer arm (44) is utilized to convey the wafer through the foregoing arcuate path with respect to the chuck so that the center of mass of the wafer coincides with the center of rotation of the chuck when the wafer is subsequently placed on same.
申请人：EATON CORPORATION
地址：Eaton Center, 1111 Superior Avenue Cleveland, Ohio 44114-2584 US
国籍：US
代理机构：Wright, Peter David John (GB)
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