reaction member
专利名称：X-RAY DIFFRACTION ATTACHMENT
UTILIZING HYDROTHERMAL REACTION 发明人：TAMURA TAKAAKI,FUJITA NORIHIKO,AOKI MASAHIRO
申请号：JP14937983
申请日：19830816
公开号：JPS6040942A
公开日：
19850304
专利内容由知识产权出版社提供
摘要：PURPOSE:To obtain X-ray diffraction pattern readily under hydrothermal conditions, by providing a pressurizing chamber and a sample chamber, which are located at the neighboring positions with a flexible film in-between, and providing a path, through which a sample is introduced into the sample chamber. CONSTITUTION:A cell part 1 has the following components: a sample chamber 6, which is located at the neighboring position of a pressurizing chamber 5, with a window member 4 comprising a flexible film in-between; a heater 7 which maintains the temperature of a sample filled in said sample chamber 6 at a specified temperature; and a window member 8, which partitions the pressurizing chamber 5 and the outside and permits X rays to transmit to the sample chamber 6 from the outside. The window member 8 desirably comprises a sintered beryllium cylinder having excellent X-ray transmitting property and intensity. Since the cell part 1 constitutes a double-structure of pressure-resisting container comprising an inner cell having the sample chamber 6 and an outer cell having the pressurizing chamber 5, the X-ray diffraction pattern can be readily obtained under the hydrothermal conditions.
申请人：KOUGIYOU KAIHATSU KENKYUSHO 更多信息请下载全文后查看

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