专利名称：Batch-type deposition apparatus having
gland portion
发明人：Kyoung-Hwan Hwang,Jin-Sung Kim,Chang-
Hyuk Ok,Jai-Young Woo,Min-Ho Choi
申请号：US11025005
申请日：20041228reaction member
公开号：US20050183664A1
公开日：
20050825
专利内容由知识产权出版社提供
专利附图：
摘要：Batch-type deposition apparatus having a gland portion are provided. The apparatus include a reaction furnace, a gas nozzle located in the reaction furnace, a gas
supply conduit located outside the reaction furnace and a gland portion for connecting the gas nozzle to the gas supply conduit. The gland portion includes a gas nozzle end extended from the gas nozzle toward an outside region of the reaction furnace and a gas supply conduit end extended from the gas supply conduit. The gas nozzle end is connected to the gas supply conduit end through a buffer member. The buffer member has an inclined inner wall for connecting an inner wall of the gas nozzle end to that of the gas supply conduit end.
申请人：Kyoung-Hwan Hwang,Jin-Sung Kim,Chang-Hyuk Ok,Jai-Young Woo,Min-Ho Choi
地址：Gyeonggi-do KR,Gyeonggi-do KR,Gyeonggi-do KR,Gyeonggi-do KR,Gyeonggi-do KR
国籍：KR,KR,KR,KR,KR
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