专利名称：FORMATION OF MASK FILM TO SHEET-FORM OBJECT
发明人：SHIMA HIROZOU,MIZUGUCHI SHINICHI 申请号：JP18104183
申请日：19830928
公开号：JPS6072278A
公开日：
19850424
reaction in the shaft专利内容由知识产权出版社提供
摘要：PURPOSE:To simplify the process of forming a pattern film by a method wherein film formation is performed while a mask film with a perforation pattern formed and a sheet-form object to be subjected to film formation are put to close contact on a drum heater electrode. CONSTITUTION:The sheet-form object 4 to be subjected to film formation is fed out of a wind-off shaft 5-1, and at the same time the mask film 9 in which the perforation pattern 10 of a shape to be subjected to film formation has been formed is fed out of a wind-off shaft 5-2. The object 4 fed out to a reaction chamber 6 and the film come to the state of close contact with each other on the drum heater electrode 11, plasma reaction being carried out in this state, and an a-Si film 15 being then deposited on the object. Further, it is possible that the film 15 doped with an impurity is deposited on the object in the next reaction chamber 6-1 by a similar plasma reaction. This method enables pattern film formation at a time by omission of a series of processes such as patterning and resist removal, resulting in the reduction of the process.
申请人：MATSUSHITA DENKI SANGYO KK
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