专利名称：MANUFACTURE OF FILM 发明人：YAMAZAKI SHIYUNPEI
申请号：JP14224780
reactive substance申请日：19801011
公开号：JPS5766626A
公开日：
19820422
专利内容由知识产权出版社提供
摘要：PURPOSE:To reduce sputtering effect and to permit mass production as well by a method wherein the activated state of reactive gas introduced in the atmosphere of plasmified carrier gas is maintained by covering the reactive gas with inert gas or hydrogen. CONSTITUTION:Vacuum in a reactive furnace 3 sealing a boat 2 fitted with a substrate 1 is extracted by a vacuum system 8 and after introducing inert gas 9 in the reactive furnace 3, carrier gas consisting of the inert gas 9 is plasmified by applying microwave energy to an activated chamber 7. And the reactive gas of silicide or germanium substance 9 is led into the activated chamber 7 from cylinders 11, 12 and charge is received from the carrier gas and completely mixed with the reactive gas to lead into the reactive furnace 3. The reactive gas receives electrical energy from the carrier gas and moves to the crystallized direction during scattering to homogeneously form a film on the substrate 1.
申请人：HANDOUTAI ENERUGII KENKYUSHO:KK
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