专利名称：Plasma processing apparatus 发明人：岩村 知明，岡村 健広，久保田 章裕申请号：JP2009059309
申请日：20090312
公开号：JP5275092B2
公开日：
20130828
专利内容由知识产权出版社提供
摘要：
PROBLEM TO BE SOLVED: To prevent alteration and etching of a radiator and insulating tube by plasma.
SOLUTION: The plasma treatment device includes: a cylindrical casing 31 of which an upper end part is closed with a closing plate 11b and a lower end part is formed in an open end; a cylindrical radiator 14 erected on an inner surface of the closing plate 11b; and the insulating tube 11 for conveying inert gas G1 via an inside of the casing 31 to the open end, and emitting to an external of the casing 31. The casing 31 is structured as a reactive gas supply path for emitting reactive gas G2 supplied to its inside from the open end to the external and forming a reactive gas atmosphere in front of the open end. The radiator 14 radiates a supplied high frequency signal S1, and primary plasma P1 by the inert gas G1 which is converted into plasma is generated in the insulating tube 11c. The primary plasma P1 is emitted from a tip end part of the insulating tube 11c in the reactive gas atmosphere to covert the reactive gas G2 into plasma, and secondary plasma P2 or the like for plasma-treating a treatment object 6 is generated.
COPYRIGHT: (C)2010,JPO&INPIT
申请人：長野日本無線株式会社
地址：長野県長野市稲里町１１６３番地国籍：JP
代理人：酒井 伸司
更多信息请下载全文后查看
>reactive to

版权声明：本站内容均来自互联网，仅供演示用，请勿用于商业和其他非法用途。如果侵犯了您的权益请与我们联系QQ:729038198，我们将在24小时内删除。