专利名称：Method of plasma-activated reactive
deposition of electrically conducting
multicomponent material from a gas phase 发明人：Georg Gartner
申请号：US08/389446
申请日：19950215
公开号：US05549937A
公开日：reactive materials studies
19960827
专利内容由知识产权出版社提供
摘要：Uniform electrically conducting multicomponent material is deposited on an electrically conducting substrate by means of a PCVD method. A plasma, for example a glow discharge plasma, a high frequency plasma or a microwave plasma is generated in a reaction space. The plasma is periodically reciprocated. Starting materials for the single components of the multicomponent material are added to a flowing gas phase. To obtain multicomponent material of the desired composition, the flowing gas phase is split into at least two flowing gas phases each comprising only starting materials for a single component of the multicomponent material. The separate gas phases are time sequentially applied to the plasma. The deposited multicomponent material may be subjected to a thermal treatment.
申请人：U.S. PHILIPS CORPORATION
代理人：Norman N. Spain
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