专利名称：Residual oxygen reduction system
发明人：Mark I. Mayeda,Steven E. Reder,Richard
Gimmi,Matthew R. Trattles
申请号：US09650164
申请日：20000829
公开号：US06635116B1
公开日：
20031021
reactor debug mode is enabled专利内容由知识产权出版社提供
专利附图：
摘要：An apparatus for reducing residual oxygen content from a processing chamber of an atmospheric reactor after the processing chamber of the atmospheric reactor has been exposed to an oxygen environment. The processing chamber of the atmospheric
reactor has an inert gas purge, including an inert gas source, for reducing a residual oxygen level within the processing chamber of the atmospheric reactor at a rate of reduction. A venturi vacuum system is enabled by the inert gas source. The venturi vacuum system draws a vacuum on the processing chamber of the atmospheric reactor and supplements the inert gas purge, thereby accelerating the rate at which the residual oxygen level is reduced within the processing chamber of the atmospheric reactor. In this manner, the vacuum created by the venturi vacuum system increases the efficiency of the inert gas purge by reducing by some moderate degree the pressure within the processing chamber of the atmospheric reactor. This provides additional gas flow within the processing chamber to physically remove the residual oxygen from the processing chamber. However, the vacuum provided by the venturi vacuum system is not high enough to cause damage to the components of the atmospheric reactor, which are not designed to withstand the forces that are created by a relatively high vacuum.
申请人：LSI LOGIC CORPORATION
代理机构：Luedeka, Neely & Graham PC
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