专利名称：SPRING FOR RESTRAINING OVER-CURRENT 发明人：NAKAMURA KAZUTO
申请号：JP20106787
申请日：19870811
公开号：JPS6446027A
公开日：
19890220
专利内容由知识产权出版社提供
spring framework guru
摘要：PURPOSE:To reduce the effect of an over-current on the electrons of a beam by providing a number of through holes on the face of a clamp used for an electron-beam exposing device and dispersing the over-current. CONSTITUTION:The end parts of a plate type metal member with elasticity is bent in two places to form a clamp 1. And, a number of through holes 4 are provided nearly uniformly on the face of the clamp 1, which is used for supporting a sample 5 for an electron-beam exposing device 7. When an electron beam is radiated on the sample 5, a magnetic field leaks generating an over-current on the clamps 1. However, since the over-current is cut off into a number of parts due to the through holes 4 while offsetting a reactional magnetic flux due to interaction, the effect on the electrons of the electron beam can be restrained.
申请人：OMRON TATEISI ELECTRON CO
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