专利名称：Aerosol deposition device
发明人：浅野 友晴，紙 英利
deposition
申请号：JP2019015793
申请日：20190131
公开号：JP2020122196A
公开日：
20200813
专利内容由知识产权出版社提供
专利附图：
摘要：Problem to be solved: to provide an aerosol deposition apparatus capable of obtaining a film having a high deposition rate and a high density. Substrate holding portion holding film deposition substrateAndFilm forming chamber having material
injection portion for injecting materialAn aerosol generating part for supplying material
particles of aerosol state to the material injection part andA carrier gas supply portion for supplying the carrier gas to the aerosol generating part andAerosol deposition apparatus comprisingThe aerosol generatorFirst roller member andHaving a second roller member;The first roller member isSaid material particleThe contact particles to charge the material particles are brought into contact with each other.The material of the material is supplied to the second roller memberThe second roller member isThe material particles are formed in contact with the carrier gas to form material particles in the aerosol state.Diagram
申请人：株式会社リコー
地址：東京都大田区中馬込１丁目３番６号
国籍：JP
代理人：舘野 千惠子
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