专利名称：Endpoint Detection of Deposition Cleaning
in a Pumping Line and a Processing Chamber
发明人：Gordon Hill
申请号：US16990396
申请日：20200811
公开号：US20220048081A1
公开日：
20220217
专利内容由知识产权出版社提供
专利附图：
摘要：A method is provided for cleaning of a processing system comprising a wafer processing chamber and a pumping line in fluid connection with the wafer processing chamber. The method includes initiating cleaning of the wafer processing chamber by
activating a chamber cleaning source and initiating cleaning of at least a portion of the pumping line by activating a foreline cleaning source coupled to the pumping line. The method also includes monitoring, at a downstream endpoint detector coupled to the pumping line, a level of a signature substance. The method further includes determining, by the downstream endpoint detector, at least one of a first endpoint of the cleaning of the wafer processing chamber or a second endpoint of the cleaning of the pumping line based on the monitoring.
申请人：MKS Instruments, Inc.
deposition
地址：Andover MA US
国籍：US
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