专利名称：PVD process for the deposition of Al2O3
deposition
and a coated cutting tool with at least one
layer of Al2O3
发明人：Dominic Diechle,Veit Schier
申请号：US16761867
申请日：20181107
公开号：US11326248B2
公开日：
20220510
专利内容由知识产权出版社提供
专利附图：
摘要：A coated cutting tool including a substrate and a single layer or multi-layer hard material coating is provided. The substrate is selected from cemented carbide,
cermet, ceramics, cubic boron nitride (cBN), polycrystalline diamond, steel or high-speed steel. The hard material coating includes at least one layer of gamma-AlO, exhibiting particularly high hardness and reduced Young's modulus. The gamma-AlOlayer of the coated cutting tool is obtainable by means of a reactive magnetron sputtering process using at least one Al target, wherein the deposition is carried out using a reaction gas composition of argon (Ar) and oxygen (O) at a total reaction gas pressure within the range from at least 1 Pa to at most 5 Pa, at an Opartial pressure within the range from 0.001 Pa to 0.1 Pa, and at a temperature within the range from 400° C. to 600° C.
申请人：WALTER AG
地址：Tubingen DE
国籍：DE
代理人：Corinne R. Gorski
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