专利名称：Production manner null of styrene
发明人：HIGASHIMURA TOSHINOBU，東村 敏
延,SAWAMOTO MITSUO，澤本 光男,ISHIHAMA
YOSHUKI，石浜 由之
申请号：JP特願平2-152246
申请日：19900611
公开号：JP第2941003号B2
公开日：
null官方更新地址
19990825
专利内容由知识产权出版社提供
摘要：PURPOSE:To obtain the subject polymer having a narrow molecular weight distribution by polymerizing styrenes in the presence of a specific compound, a Lewis acid and a quaternary ammonium salt. CONSTITUTION:Styrenes (e.g. styrene) expressed by formula I (R<1> is monofunctional organic group; R<2> is H or methyl; (n) is an integer of 0-5) are polymerized in the presence of a compound expressed by formula II [R<3> and R<5> are H or monofunctional organic group; R<4> is H or methyl; X us group derived from anion X<-> of monofunctional protonic acid (HX) ; (n) is an integer of 0-5] (used in an amount of preferably 5-10000 molar ratio of the styrenes/ compound expressed by formula II), a Lewis acid such as SnCl4 and a quater nary ammonium salt (e.g. a tetraalkylammonium chloride) to afford the objective polymer.
申请人：HIGASHIMURA TOSHINOBU，東村 敏延
地址：京都府京都市左京区北白川伊織町35
国籍：JP
代理人：岡田 数彦
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