专利名称：REACTION CHAMBER FOR
SEMICONDUCTOR MANUFACTURING
APPARATUS AND SEMICONDUCTOR
MANUFACTURING APPARATUS
发明人：OKABE, Akira
申请号：JP2005011979
申请日：20050629
公开号：WO07/000824P1
公开日：
20070104
专利内容由知识产权出版社提供
摘要：A reaction chamber for a semiconductor manufacturing apparatus capable of reducing the formation of particles and the semiconductor manufacturing apparatus. The reaction chamber for the semiconductor manufacturing apparatus comprises a support body having an opening part formed at a predetermined position and movable in the vertical direction, a raising member inserted into the opening part and movable in the vertical direction, a restriction member fixed to the lower side of the support body at the position of the opening part, and a reaction chamber which stores the support body, the raising member, and the restriction member and into which a reactive gas is supplied.
申请人：OKABE, Akira
地址：147-40, Masuragaharamachi, Ohmura-shi, Nagasaki 8560022 JP,c/o Epicrew Corporation 147-40, Masuragaharamachi Ohmura-shi, Nagasaki 8560022 JP 国籍：JP,JP
reaction member代理机构：ARIYOSHI, Noriharu
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