专利名称：THREE-POLE DISCHARGE CHEMICAL REACTOR
发明人：ASAMAKI TATSUO
申请号：JP31995688
reactor pressure vessel申请日：19881219
公开号：JPH02166282A
公开日：
19900626
专利内容由知识产权出版社提供
摘要：PURPOSE:To perform formation of a good-quality thin film and surface modification, etc., at low pressure and high velocity by performing discharge among an electrode equipped with a magnetic means generating a curved magnetic field, the wall of a vessel utilized for the other electrode and an electrode with a base placed thereon, decomposing and allowing compd. vapor to react. CONSTITUTION:Magnets 22, 23 are provided to the rear of an electrode 25 of a discharge source 20 in a vacuum vessel 11 and the curved lines 21 of magnetic force are formed on the surface of the electrode 25. Highdensity plasma 28 is generated by discharge between the electrode 25 and the vacuum vessel 11 utilized for a third electrode and many amount of radicals and active species are produced by this magnetic field. Reactive gas introduced through a conduit 62 is decomposed by these radicals. Formation of a thin film on a base board 51, etching and modification, etc., are formed by this decomposition, reaction and the above-mentioned active species. In this case, weak plasma 29 is generated by discharge between an electrode 53 with the base plate 51 placed thereon and the vacuum vessel 11. Ions are drawn out from the above-mentioned plasma 28 and reaction is promoted and also discharge is regulated so that destruction or damage, etc., of crystal on the base board
51 are not generated.
申请人：ANELVA CORP
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