专利名称：Plasma CVD deposition system 发明人：沖本 忠雄，瀬川 利規，黒川 好徳
申请号：JP2015003774
申请日：20150113
公开号：JP6580829B2
公开日：
20190925
专利内容由知识产权出版社提供
摘要：Provided is a plasma CVD film-forming device for preventing the occurrence of an abnormal discharge in a section where a substrate is not wrapped in a range where a film is formed in the axial direction of a film-forming roller. The plasma CVD film-forming device (10) is equipped with: a vacuum chamber (1); a metal film-forming roller (2) having a belt-shaped substrate wrapped around one section of the outer-circumferential surface thereof in the circumferential direction; a magnetic-field generation unit (3) for generating a magnetic field outside the section of the outer-circumferential surface of the film-forming roller (2) around which the substrate is wrapped, and positioned inside the film-forming roller (2); a power source (4) for imparting, to the film-forming roller (2), an AC voltage for generating plasma inside the magnetic field region, and connected to the film-forming roller (2); and a cover (9) for covering a section (2b) of the outer-circumferential surface of the film-forming roller (2), not in contact with the substrate (A), and positioned opposite the section (2a) around which the substrate (A) is wrapped, with the rotation axis of the film-forming roller (2) interposed therebetween.
申请人：株式会社神戸製鋼所
地址：兵庫県神戸市中央区脇浜海岸通二丁目２番４号deposition
国籍：JP
代理人：小谷 悦司，小谷 昌崇，村松 敏郎更多信息请下载全文后查看

版权声明：本站内容均来自互联网，仅供演示用，请勿用于商业和其他非法用途。如果侵犯了您的权益请与我们联系QQ:729038198，我们将在24小时内删除。